The present invention discloses compound of Formula A represented by the structure ##STR00001##

The present invention discloses compound of Formula A represented by the structure ##STR00001##

Methods and compositions containing a phorbol ester or a derivative of a phorbol ester are provided for the treatment and prevention of stroke and the sequelae of stroke. Additional compositions and methods are provided which employ a phorbol ester or derivative compound in combination with at least one additional agent to yield more effective treatment tools to treat or prevent stroke and the long term effects of stroke in mammalian subjects.

Methods and compositions containing a phorbol ester or a derivative of a phorbol ester are provided for the treatment and prevention of stroke and the sequelae of stroke. Additional compositions and methods are provided which employ a phorbol ester or derivative compound in combination with at least one additional agent to yield more effective treatment tools to treat or prevent stroke and the long term effects of stroke in mammalian subjects.

Embodiments of the invention are directed to cooling compounds and cooling compositions having a unique cooling perception, as well as various edible, potable, and/or cosmetic products containing one or more cooling compounds having a general Formula (I): wherein Q is selected from CR.sup.1R.sup.2 or CH-CH(CH.sub.2OR.sup.8)CH.sub.2OR.sup.9; wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of CHO, CO.sub.2H; CH.sub.2CH.sub.2OH; CHR.sup.10OR.sup.11, and CHR.sup.10OR.sup.12; wherein R.sup.8 and R.sup.9 are independently H, or in combination form a spiroacetal or spiroketal moiety; wherein each R.sup.10 is independently H or CH.sub.3; wherein R.sup.11 and R.sup.12 are independently selected from H, substituted or unsubstituted C1 to C6 alkyls, substituted or unsubstituted cycloalkyls, substituted or unsubstituted alkaryls, substituted or unsubstituted aryls or heteroaryls, and substituted or unsubstituted acyls, or wherein R.sup.11 and R.sup.12 in combination form a spiroketal or a spiroacetal moiety; wherein R.sup.3, R.sup.4, R.sup.5, and R.sup.6 are independently selected from H, CH.sub.3, and CH.sub.2CH.sub.3; and wherein R.sup.7 is selected from H, iso-propyl, isopropenyl, and sec-butyl; with the proviso that R.sup.3, R.sup.4, R.sup.5, R.sup.6, and R.sup.7 are not all H.

##STR00001##

Embodiments of the invention are directed to cooling compounds and cooling compositions having a unique cooling perception, as well as various edible, potable, and/or cosmetic products containing one or more cooling compounds having a general Formula (I): wherein Q is selected from CR.sup.1R.sup.2 or CH-CH(CH.sub.2OR.sup.8)CH.sub.2OR.sup.9; wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of CHO, CO.sub.2H; CH.sub.2CH.sub.2OH; CHR.sup.10OR.sup.11, and CHR.sup.10OR.sup.12; wherein R.sup.8 and R.sup.9 are independently H, or in combination form a spiroacetal or spiroketal moiety; wherein each R.sup.10 is independently H or CH.sub.3; wherein R.sup.11 and R.sup.12 are independently selected from H, substituted or unsubstituted C1 to C6 alkyls, substituted or unsubstituted cycloalkyls, substituted or unsubstituted alkaryls, substituted or unsubstituted aryls or heteroaryls, and substituted or unsubstituted acyls, or wherein R.sup.11 and R.sup.12 in combination form a spiroketal or a spiroacetal moiety; wherein R.sup.3, R.sup.4, R.sup.5, and R.sup.6 are independently selected from H, CH.sub.3, and CH.sub.2CH.sub.3; and wherein R.sup.7 is selected from H, iso-propyl, isopropenyl, and sec-butyl; with the proviso that R.sup.3, R.sup.4, R.sup.5, R.sup.6, and R.sup.7 are not all H.

##STR00001##

The resist composition exhibits a high contrast, improved maximum resolution, and satisfactory sensitivity and line width roughness (LWR) when processed by lithography using high-energy radiation, especially electron beam (EB) and EUV, and a pattern forming process using the resist composition. The resist composition comprising (A) a base polymer containing a polymer comprising repeat units having an acid labile group and repeat units having a carboxy group, (B) an organic solvent, and (C) a hypervalent iodine compound having formula (1):

##STR00001##

The resist composition exhibits a high contrast, improved maximum resolution, and satisfactory sensitivity and line width roughness (LWR) when processed by lithography using high-energy radiation, especially electron beam (EB) and EUV, and a pattern forming process using the resist composition. The resist composition comprising (A) a base polymer containing a polymer comprising repeat units having an acid labile group and repeat units having a carboxy group, (B) an organic solvent, and (C) a hypervalent iodine compound having formula (1):

##STR00001##

This disclosure relates to modulators of liver receptor homologue 1 (LRH-1) and methods of managing disease and conditions related thereto. In certain embodiments, modulators are derivatives of hexahydropentalene. In certain embodiments, this disclosure relates to methods of treating or preventing cancer, diabetes, or cardiovascular disease by administering an effective amount of a hexahydropentalene derivative disclosed herein.

This disclosure relates to modulators of liver receptor homologue 1 (LRH-1) and methods of managing disease and conditions related thereto. In certain embodiments, modulators are derivatives of hexahydropentalene. In certain embodiments, this disclosure relates to methods of treating or preventing cancer, diabetes, or cardiovascular disease by administering an effective amount of a hexahydropentalene derivative disclosed herein.