A dispersion that inorganic oxide microparticles may be dispersed at a high concentration in a solvent, a composition for film formation having high transparency, high refractive index and adhesion to a base layer. Inorganic oxide microparticles wherein an amphiphilic organosilicon compound having one or more selected from a polyoxyethylene group, a polyoxypropylene group, or a polyoxybutylene group as a hydrophilic group, and one or more selected from a C.sub.1-18 alkylene group or a vinylene group as a hydrophobic group bonded to a surface of modified metal oxide colloidal particles (C) having a primary particle diameter of 2 to 100 nm, the modified metal oxide colloidal particles wherein a surface of metal oxide colloidal particles (A) having a primary particle diameter of 2 to 60 nm as a nucleus is coated with a coating material (B) including metal oxide colloidal particles having a primary particle diameter of 1 to 4 nm.

Precipitated silica having a broad particle size distribution and large median particle size as well as its method of manufacture.

A solid composite material combining: an inorganic pigment in the form of discrete particles each comprising a colored core and a coating adapted to allow light to pass through and a matrix based on metalloid or metal oxide, said matrix being adapted to allow light to pass through.

A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90?F.sub.BEFORE/F.sub.AFTER?1.10, and 5?F.sub.SINTERING/F.sub.BEFORE?20, in which F.sub.BEFORE represents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, F.sub.AFTER represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and F.sub.SINTERING represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600? C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.

A scattering particle includes a core and a shell, wherein the shell includes a first layer including a compound capable of reacting with oxygen and/or moisture, and a second layer including a compound decomposable by light and/or heat.

A precipitated silica having a CTAB specific surface in the range of from 50 to 300 m.sup.2/g; a BET/CTAB specific surface ratio equal to or greater than 1.3 and comprising at least one polycarboxylic acid.

The present invention provides a surface-treated silica filler for suppressing an increase in viscosity when added to a resin composition used for applications such as a semiconductor sealing material, and the resin composition containing the surface-treated silica filler. The surface-treated silica filler of the present invention is surface-treated with a basic substance having an acid dissociation constant (pKa) of its conjugate acid of 9.4 or more.

There is disclosed a method of producing etched non-porous particles. The method includes, in some examples, coating a non-porous particle with a hydrophilic polymer and treating the coated particle with acid or base. Also provided is etched non-porous particles capable of separating a variety of analytes, including biomolecules.

A method for manufacturing a low dielectric silica powder incudes heat-treating a silica powder at a temperature of 500? C. to 1500? C. to achieve 0.0005 or less of a dielectric loss tangent of the silica powder at 10 GHz, and etching a surface of the heat-treated silica powder with an etching solution. A silica powder with an extremely small dielectric loss tangent, a resin composition containing the same, and a method for manufacturing a silica powder with a low dielectric loss tangent and strong adhesion at the interface to resin are achieved.

A dispersion that inorganic oxide microparticles may be dispersed at a high concentration in a solvent, a composition for film formation having high transparency, high refractive index and adhesion to a base layer. Inorganic oxide microparticles wherein an amphiphilic organosilicon compound having one or more selected from a polyoxyethylene group, a polyoxypropylene group, or a polyoxybutylene group as a hydrophilic group, and one or more selected from a C.sub.1-18 alkylene group or a vinylene group as a hydrophobic group bonded to a surface of modified metal oxide colloidal particles (C) having a primary particle diameter of 2 to 100 nm, the modified metal oxide colloidal particles wherein a surface of metal oxide colloidal particles (A) having a primary particle diameter of 2 to 60 nm as a nucleus is coated with a coating material (B) including metal oxide colloidal particles having a primary particle diameter of 1 to 4 nm.