Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

A programmable controller for controlling an ultraviolet (UV) sensor may adjust an excitation voltage provided to the UV sensor based at least in part on a programmable sensitivity offset in order to produce an excitation voltage that results in a desired UV sensitivity for the UV sensor. The programmable sensitivity offset may be set for the UV sensor at the factory, set during commissioning of the UV sensor in the field, and/or automatically altered over time to help compensate for a degradation in sensitivity of the UV sensor.

An approach for controlling ultraviolet intensity over a surface of a light sensitive object is described. Aspects involve using ultraviolet radiation with a wavelength range that includes ultraviolet-A and ultraviolet-B radiation to irradiate the surface. Light sensors measure light intensity at the surface, wherein each sensor measures light intensity in a wavelength range that corresponds to a wavelength range emitted from at least one of the sources. A controller controls the light intensity over the surface by adjusting the power of the sources as a function of the light intensity measurements. The controller uses the light intensity measurements to determine whether each source is illuminating the surface with an intensity that is within an acceptable variation with a predetermined intensity value targeted for the surface. The controller adjusts the power of the sources as a function of the variation to ensure an optimal distribution of light intensity over the surface.

A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

A display includes a display component having a display surface displaying an image thereon and an ultraviolet ray detection section included in a section of the display component that is to be irradiated with external light, and the ultraviolet ray detection section contains material that changes its color by irradiation of ultraviolet rays.

A system capable of detecting and/or sterilizing surface(s) of an object using ultraviolet radiation is provided. The system can include a disinfection chamber and/or handheld ultraviolet unit, which includes ultraviolet sources for inducing fluorescence in a contaminant and/or sterilizing a surface of an object. The object can comprise a protective suit, which is worn by a user and also can include ultraviolet sources for disinfecting air prior to the air entering the protective suit. The system can be implemented as a multi-tiered system for protecting the user and others from exposure to the contaminant and sterilizing the protective suit after exposure to an environment including the contaminant.

A Thomson scattering measurement system according to the present disclosure includes: a transfer optical system provided on an optical path of a slit light beam group generated by division through a slit array and configured to transfer the slit light beam group to a plurality of transfer image groups separated from each other; and a second slit provided on an optical path of light from the transfer image groups and configured to selectively allow light from a plurality of transfer images positioned on a straight line extending in a direction corresponding to a first direction to pass through the second slit, the transfer images corresponding to slit light beams at positions different from each other in a second direction in the slit light beam group among transfer images included in the transfer image groups.

In an example, a light control system includes a power converter, a light source, a sensor, and a control device. The power converter can convert an input power received from a power source to a supply power, and includes a power factor corrector (PFC) configured to adjustably control an electrical parameter of the supply power. The light source can, using the supply power, emit light at an intensity related to the electrical parameter. The sensor can sense a condition related to operation of the light source. The control device is communicatively coupled to the PFC and the sensor, and configured to: (i) receive, from the sensor, a sensor signal indicating an input parameter related to the condition, and (ii) based on sensor signal, provide a feedback signal to the PFC to cause the PFC to adjust, based on the input parameter, the electrical parameter of the supply power.

In an example, a power factor corrector (PFC) including a first PFC input, a second PFC input, and a PFC output. The first PFC input is configured to receive an input power from a power source. The second PFC input is configured to receive a signal from a feedback circuit. The PFC output configured to output a direct current (DC) power, which is based on the input power at the first PFC input and the signal at the second PFC input. The feedback circuit is coupled to the PFC output and the second PFC input. The feedback circuit is configured to provide the signal at the second PFC input based on an input parameter related to a condition that is sensible by a sensor. The condition is related to operation of a load.