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Patent classifications
G
PHYSICS
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G03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
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7/00
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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G03F7/004
Photosensitive materials
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G03F7/022
Quinonediazides
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G03F7/023
Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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G03F7/0233
characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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G03F7/0236
Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
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