• Technology trends
  • Patent search
  • Sign In
  • Sign Up
Patent classifications
G
PHYSICS
Load children
G03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
Load children
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
Load children
7/00
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Load children Filter patents View analytics View as hierarchy
G03F7/70
Microphotolithographic exposure; Apparatus therefor
Load children Filter patents View analytics View as hierarchy
G03F7/70483
Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
Load children Filter patents View analytics View as hierarchy
G03F7/70605
Workpiece metrology
Load children Filter patents View analytics View as hierarchy
G03F7/70681
Metrology strategies
Load children Filter patents View analytics View as hierarchy
G03F7/706833
Sampling plan selection or optimisation, e.g. select or optimise the number, order or locations of measurements taken per die, workpiece, lot or batch
Filter patents View analytics View as hierarchy