A transistor includes a plurality of gate fingers that extend in a first direction and are spaced apart from each other in a second direction, each of the gate fingers comprising at least spaced-apart and generally collinear first and second gate finger segments that are electrically connected to each other. The first gate finger segments are separated from the second gate finger segments in the first direction by a gap region that extends in the second direction. A resistor is disposed in the gap region.

A semiconductor device includes a first semiconductor element, a second semiconductor element, an insulating layer, a sealing resin, a first external terminal, a second external terminal, a first connecting conductor and a second connecting conductor. Each of the semiconductor elements has an element front surface, an element back surface, and a plurality of front surface electrodes disposed on the element front surface. The insulating layer has an insulating layer back surface facing each of the element front surfaces and an insulating layer front surface facing away from the insulating layer back surface. The sealing resin has a resin front surface in contact with the insulating layer back surface and a resin back surface facing away from the resin front surface. The sealing resin covers a portion of each semiconductor element. Each external terminal is disposed between the first and the second semiconductor elements and exposed from the resin back surface. The first connecting conductor is disposed on the insulating layer and connects at least one of the front surface electrodes of the first semiconductor element to the first external terminal. The second connecting conductor is disposed on the insulating layer and connects at least one of the front surface electrodes of the second semiconductor to the second terminal.

A transistor includes first and second sets of gate fingers formed in an active area of a semiconductor substrate, an input bond pad formed in the semiconductor substrate and spaced apart from the active area, a first conductive structure with a proximal end coupled to the input bond pad and a distal end coupled to the first set of gate fingers, and a second conductive structure with a proximal end coupled to the input bond pad and a distal end coupled to the second set of gate fingers. A non-conductive gap is present between the distal ends of the first and second conductive structures. The transistor further includes an odd-mode oscillation stabilization circuit that includes a first resistor with a first terminal coupled to the distal end of the first conductive structure, and a second terminal coupled to the distal end of the second conductive structure.

A semiconductor chip stack module that includes a substrate, two first semiconductor chips supported by the substrate, and a second semiconductor chip stacked on both of the two first semiconductor chips. The second semiconductor chip is electrically connected to both of the two first semiconductor chips by a conductive paste configured between the second semiconductor chip and both of the two first semiconductor chips. As multiple standard chips are stacked in the power module, and their number as well as the connection methods (e.g. series or parallel) are flexible so that the user can choose which electric characteristic(s) to be increased in the power module with the stacked chips.

A semiconductor device includes a substrate, a channel layer provided on the substrate, a semiconductor layer provided on the channel layer, gate fingers and a gate connection wiring provided on the semiconductor layer, and an insulating film provided between the semiconductor layer and the gate fingers, wherein the gate fingers includes a first gate finger, and a second gate finger closer to the center of the gate fingers in an arrangement direction than the first gate finger, wherein a first distance between a lower surface of the first gate finger in contact with the insulating film and an upper surface of the channel layer in contact with the semiconductor layer is greater than a second distance between a lower surface of the second gate finger in contact with the insulating film and the upper surface of the channel layer in contact with the semiconductor layer.

An integrated circuit, including a source region, a drain region, a channel region between the source region and the drain region, and a gate for inducing a conductive path through the channel region. The integrated circuit also includes structure, proximate a curved length of the gate, for inhibiting current flow along a portion of the channel region.

A semiconductor device is made by: forming a metal film containing Al on a surface of a substrate product including a substrate and a nitride semiconductor layer on the substrate, the metal film covering a via hole forming predetermined region, and the surface of the substrate product being located on the nitride semiconductor layer side, forming an etching mask having an opening for exposing the via hole forming predetermined region on a back surface of the substrate product, the back surface of the substrate product being located on the substrate side, and forming a via hole in the substrate product by reactive ion etching, the via hole reaching the surface from the back surface and exposing the metal film. In the forming of the via hole, a reaction gas containing fluorine is used during a period at least including a termination of etching.

A semiconductor module includes a laminated substrate including an insulating board and a plurality of circuit boards that are arranged on an upper face of the insulating board, the plurality of circuit boards including first and second circuit boards, a semiconductor element disposed on the first circuit board and including, on an upper face of the semiconductor element, a main electrode, a gate pad, and a gate runner electrically connected to the gate pad, and a first wiring member electrically connecting the main electrode to the second circuit board. The gate runner extends so as to divide the main electrode into a plurality of electrodes including a first main electrode at a first side and a second main electrode at a second side, and the first wiring member is arranged to cross over the gate runner.

At least one unit transistor is arranged over a substrate. A first wiring as a path of current that flows to each unit transistor is arranged over the at least one unit transistor. An inorganic insulation film is arranged over the first wiring. At least one first opening overlapping a partial region of the first wiring in a plan view is provided in the inorganic insulation film. An organic insulation film is arranged over the inorganic insulation film. A second wiring coupled to the first wiring through the first opening is arranged over the organic insulation film and the inorganic insulation film. In a plan view, a region in which the organic insulation film is not arranged is provided outside a region in which the first wiring is arranged. The second wiring is in contact with the inorganic insulation film outside the region in which the first wiring is arranged.

A wire interconnect structure of an integrated circuit includes a first wiring layer, a second wiring layer, a third wiring layer, first conductive via structures, second conductive via structures, and third conductive via structures. The first wiring layer includes a first wire connected to first transistors and a second wire connected to second transistors. The second wiring layer includes third wires and fourth wires that are perpendicular to the first wire and the second wire. The third wiring layer includes a fifth wire and a sixth wire that are parallel to the first wire and the second wire and respectively connected to a first contact pad and a second contact pad above. The first transistors are electrically connected to the first contact pad through the first wire, and the second transistors are electrically connected to the second contact pad through the second wire.