A system and method for forming a semiconductor die contact structure is disclosed. An embodiment comprises a top level metal contact, such as copper, with a thickness large enough to act as a buffer for underlying low-k, extremely low-k, or ultra low-k dielectric layers. A contact pad or post-passivation interconnect may be formed over the top level metal contact, and a copper pillar or solder bump may be formed to be in electrical connection with the top level metal contact.

A pad structure for a complementary metal-oxide-semiconductor (CMOS) image sensor is provided. A semiconductor substrate is arranged over a back end of line (BEOL) metallization stack, and comprises a scribe line opening. A buffer layer lines the scribe line opening. A conductive pad comprises a base region and a protruding region. The base region is arranged over the buffer layer in the scribe line opening, and the protruding region protrudes from the base region into the BEOL metallization stack. A dielectric layer fills the scribe line opening over the conductive pad, and is substantially flush with an upper surface of the semiconductor substrate. Further, a method for manufacturing the pad structure, as well as the CMOS image sensor, are provided.

In a described example, an apparatus includes: a package substrate having a die pad configured for receiving a semiconductor die, and having conductive leads spaced from the die pad; a semiconductor die mounted on the die pad, the semiconductor die having bond pads on an active surface configured for making electrical connections; electrical connections coupling the bond pads of the semiconductor die to the conductive leads; mold compound covering a portion of the package substrate, the semiconductor die, and the electrical connections, with the leads extending through the mold compound and having end portions exposed from the mold compound; and the leads having a first portion with a first width and extending with the first width from the mold compound to a second portion having a second width that greater than the first width.

A chip-on-film package includes a base substrate on which a first pad region, a second pad region, and a third region located between the first pad region and the second pad region are defined, a dummy pad disposed on the first pad region, input pads disposed on the first pad region, output pads disposed on the second region, a first detection line disposed on the base substrate, and a second detection line disposed on the base substrate. The first detection line is connected to a first input pad and a second input pad via the second pad region to form a first loop between the first input pad and the second input pad, and the second detection line is connected to the dummy pad and the first detection line via the third region to form a second loop between the dummy pad and the first input pad.

A method for manufacturing a semiconductor device includes a process of providing two source electrodes on a substrate, a process of providing a gate electrode on one surface of the substrate between the two source electrodes, a process of providing an insulating film on the gate electrode, the substrate, and side surfaces of the two source electrodes, a process of providing an airbridge foundation resist on the insulating film, providing an airbridge on the two source electrodes and the airbridge foundation resist, and a process of removing the airbridge foundation resist, in which surfaces of the two source electrodes at sides opposite to the substrate and a front surface of the airbridge foundation resist provided in the subsequent process are substantially coplanar.

A semiconductor device includes a semiconductor body; a gate; a field plate, spaced from the gate, the field plate having a strip-like shape with main extensions along a first direction, the strip-like shape having a first and a second end opposite to one; a first conductive pad in electrical contact with the field plate at the first end through a first connecting region; a second conductive pad in electrical contact with the field plate at the second end through a second connecting region; and a third conductive pad in electrical contact with the field plate at the second end through a third connecting region. The conductive pads allow the use of the field plate as a temperature sensor.

A power amplifier includes a substrate, first and second transistor amplifiers, and at least one matching circuit. Respective output terminals of the first and second transistor amplifiers are coupled to a combining node, and the matching circuit includes one or more passive electrical components coupled between one of the respective output terminals and the combining node. At least one of the first and second transistor amplifiers or the one or more passive electrical components is mounted on the substrate in a flip chip configuration. The matching circuit may include a shunt inductance that is coupled to the one of the respective drain terminals by a conductive bump. Related devices are also discussed.

Representative techniques and devices including process steps may be employed to mitigate the potential for delamination of bonded microelectronic substrates due to metal expansion at a bonding interface. For example, a through-silicon via (TSV) may be disposed through at least one of the microelectronic substrates. The TSV is exposed at the bonding interface of the substrate and functions as a contact surface for direct bonding.

A power semiconductor device includes a substrate having a first conductivity type and being provided with a drift layer having the first conductivity type; a well region having a second conductivity type; source regions having the first conductivity type; gate insulating layers in gate trenches penetrating the source regions and the well region and including a high-K material; gate electrodes on the gate insulating layers and including a metal material; a gate bus line connected to ends of the gate electrodes; a gate pad spaced apart from the gate bus line; a connector electrically connecting the gate bus line to the gate pad and including a material having a resistivity greater than those of the gate bus line and the gate pad; a dielectric layer on the gate electrodes, the gate bus line, the gate pad, and the connector; and a drain electrode on a lower surface of the substrate.

In an example, a silicon carbide device includes a silicon carbide body. The silicon carbide body includes a central region and a peripheral region surrounding the central region. The central region includes a source region of a first conductivity type. The peripheral region includes a doped region of a second conductivity type. A stripe-shaped gate electrode extends through the central region and into the peripheral region. A contiguous source metallization is formed on the central region and on an inner portion of the peripheral region. The contiguous source metallization and the source region form a first ohmic contact in the central region. The contiguous source metallization and the doped region form a second ohmic contact in the peripheral region.