A lateral power semiconductor device is provided. Some semiconductor devices show signs of failure caused by a short between metal layers, which have showed cracks in the insulator layer between the two metals which causes the short-circuit. Removing the superimposition between the borders of the metal layers reduces the risk of cracks in the insulator layer and thereby increases the reliability of the device. The lateral power semiconductor device of the present disclosure has one of these metal layers configured so that the metal has been removed at the area where it superimposes the area of the other metal layer so that these are isolated from each other not only by the insulation layer in between these metal layers, but also by the fact that they are isolated by a lateral spacing so that they do not lie on top of each other.

A semiconductor device includes a die body having a frontside and a transistor having an active area formed in the die body, the active area being bounded by an outer periphery. An interconnect structure is formed over the frontside of the die body and contains patterned electrically conductive material defining first, second, and third contacts electrically coupled to first, second, and third subregions, respectively, within the active area of the transistor. A frontside input/output (I/O) interface is formed in an outer portion of the interconnect structure. The frontside I/O interface contains first, second, and third contact pads, the first contact pad being electrically connected to the first contact, the second contact pad being electrically connected to the second contact, and the third contact pad being electrically connected the third contact, wherein the third contact pad is positioned at a location overlying the active area of the transistor.

Embodiments of the present invention provide a multiple fin field effect transistor (finFET) with low-resistance gate structure. A metallization line is formed in parallel with the gate, and multiple contacts are formed over the fins which connect the metallization line to the gate. The metallization line provides reduced gate resistance, which allows fewer transistors to be used for providing In-Out (IO) functionality, thereby providing space savings that enable an increase in circuit density.

A method of forming a semiconductor package includes providing a metal baseplate including a base section and a plurality of metal posts, the base section being a planar pad of substantially uniform thickness, the plurality of metal posts each extending up from a planar upper surface of the base section, mounting a semiconductor die on the upper surface of the metal baseplate, forming an encapsulant body of electrically insulating mold compound on the upper surface of the base section, electrically connecting terminals of the semiconductor die to the metal posts, and removing the base section so as to form package contacts from the metal posts at a first surface of the encapsulant body.

A multi-finger transistor includes a circuit suppressing a variation in voltage current distribution. The circuit connects gate fingers (21) to each other, or source fingers (31) to each other in a region which is located outside an active region (11) and on a side where a drain pad (42) is disposed. The multi-finger transistor is configured to be linearly symmetric with respect to a direction of propagation of a signal from a gate pad (22) at the position of the gate pad (22).

The present technology relates to a semiconductor apparatus, a production method, and an electronic apparatus that enable semiconductor apparatuses to be laminated and the laminated semiconductor apparatuses to be identified. A semiconductor apparatus that is laminated and integrated with a plurality of semiconductor apparatuses, includes a first penetrating electrode for connecting with the other semiconductor apparatuses and a second penetrating electrode that connects the first penetrating electrode and an internal device, the second penetrating electrode being arranged at a position that differs for each of the laminated semiconductor apparatuses. The second penetrating electrode indicates a lamination position at a time of lamination. An address of each of the laminated semiconductor apparatuses in a lamination direction is identified by writing using external signals after lamination. The present technology is applicable to a memory chip and an FPGA chip.

The present invention discloses an implementation method for stacked connection between isolated circuit components, whose setting is according to at least two circuit components connecting in parallel/series in a circuit, wherein, in accordance with a circuit connection configuration, a plurality of corresponding pins of the components are soldered directly, making the components form an integrated module in accordance with a desired connection configuration of the circuit, and saving circuit boards and wires. Comparing to the circuit limited in a PCB in the prior art, it is possible to construct a circuit unit by welding connection in a way of building-block approach, achieving a circuit in a 3D space through directly welding between components, and owning a wider design space, it may shorten the time used for a circuit from design to process.

An electronic device can include a low-side HEMT including a segmented gate electrode; and a high-side HEMT coupled to the low-side HEMT, wherein the low-side and high voltage HEMTs are integrated within a same semiconductor die. In another aspect, an electronic device can include a source electrode; a low-side HEMT; a high-side HEMT coupled to the low-side HEMT; and a resistive element. In an embodiment, the resistive element can be coupled to the source electrode and a gate electrode of the high voltage HEMT, and in another embodiment, the resistive element can be coupled to the source electrode and a drain of the low-side HEMT. A process of forming an electronic device can include forming a channel layer over a substrate; and forming a gate electrode over the channel layer. The gate electrode can be a segmented gate electrode of a HEMT.

A compound semiconductor device includes a heterojunction bipolar transistor and a bump. The heterojunction bipolar transistor includes a plurality of unit transistors. The bump is electrically connected to emitters of the plurality of unit transistors. The plurality of unit transistors are arranged in a first direction. The bump is disposed above the emitters of the plurality of unit transistors while extending in the first direction. The emitter of at least one of the plurality of unit transistors is displaced from a center line of the bump in the first direction toward a first side of a second direction which is perpendicular to the first direction. The emitter of at least another one of the plurality of unit transistors is displaced from the center line of the bump in the first direction toward a second side of the second direction.

Packaging solutions for devices and systems comprising lateral GaN power transistors are disclosed, including components of a packaging assembly, a semiconductor device structure, and a method of fabrication thereof. In the packaging assembly, a GaN die, comprising one or more lateral GaN power transistors, is sandwiched between first and second leadframe layers, and interconnected using low inductance interconnections, without wirebonding. For thermal dissipation, the dual leadframe package assembly can be configured for either front-side or back-side cooling. Preferred embodiments facilitate alignment and registration of high current/low inductance interconnects for lateral GaN devices, in which contact areas or pads for source, drain and gate contacts are provided on the front-side of the GaN die. By eliminating wirebonding, and using low inductance interconnections with high electrical and thermal conductivity, PQFN technology can be adapted for packaging GaN die comprising one or more lateral GaN power transistors.