Patent classifications
H01L2924/12
Method for fabricating a semiconductor device comprising a paste layer and semiconductor device
A semiconductor device and method for fabricating a semiconductor device, comprising a paste layer is disclosed. In one example the method comprises attaching a substrate to a carrier, wherein the substrate comprises a plurality of semiconductor dies. A layer of a paste is applied to the substrate. The layer above cutting regions of the substrate is structured. The substrate is cut along the cutting regions.
Switch device having a pulldown transistor and a voltage clamp
Transformer-driven power switch devices are provided for switching high currents. These devices include power switches, such as Gallium Nitride (GaN) transistors. Transformers are used to transfer both control timing and power for controlling the power switches. These transformers may be coreless, such that they may be integrated within a silicon die. Rectifiers, pulldown control circuitry, and related are preferably integrated in the same die as a power switch, e.g., in a GaN die, such that a transformer-driven switch device is entirely comprised on a silicon die and a GaN die, and does not necessarily require a (large) cored transformer, auxiliary power supplies, or level shifting circuitry.
Device assembly structure and method of manufacturing the same
A device assembly structure includes a first device and at least one second device. The first device has a first active surface and a first backside surface opposite to the first active surface, and includes a plurality of first electrical contacts disposed adjacent to the first active surface. The second device has a second active surface and a second backside surface opposite to the second active surface, and includes a plurality of second electrical contacts disposed adjacent to the second active surface. The second active surface of the second device faces the first active surface of the first device, the second electrical contacts of the second device are electrically connected to the first electrical contacts of the first device, and a thickness of the second device is less than or equal to one fifth of a thickness of the first device.
SEMICONDUCTOR DEVICE
A semiconductor device includes a lead, a semiconductor element, and a sealing resin. The lead includes an island portion having an obverse surface and a reverse surface facing opposite sides in a thickness direction. The semiconductor element is mounted on the obverse surface of the island portion. The sealing resin covers the semiconductor element and the island portion. The sealing resin has a first portion and a second portion that overlaps with the island portion as viewed in the thickness direction. The sealing resin is configured such that the infrared transmittance of the second portion is higher than that of the first portion.
Semiconductor device and method of forming ultra high density embedded semiconductor die package
A semiconductor device has a plurality of semiconductor die. A first prefabricated insulating film is disposed over the semiconductor die. A conductive layer is formed over the first prefabricated insulating film. An interconnect structure is formed over the semiconductor die and first prefabricated insulating film. The first prefabricated insulating film is laminated over the semiconductor die. The first prefabricated insulating film includes glass cloth, glass fiber, or glass fillers. The semiconductor die is embedded within the first prefabricated insulating film with the first prefabricated insulating film covering first and side surfaces of the semiconductor die. The interconnect structure is formed over a second surface of the semiconductor die opposite the first surface. A portion of the first prefabricated insulating film is removed after disposing the first prefabricated insulating film over the semiconductor die. A second prefabricated insulating film is disposed over the first prefabricated insulating film.
Structure and Method for Fabricating a Computing System with an Integrated Voltage Regulator Module
Systems that include integrated circuit dies and voltage regulator units are disclosed. Such systems may include a voltage regulator module and an integrated circuit mounted in a common system package. The voltage regulator module may include a voltage regulator circuit and one or more passive devices mounted to a common substrate, and the integrated circuit may include a System-on-a-chip. The system package may include an interconnect region that includes wires fabricated on multiple conductive layers within the interconnect region. At least one power supply terminal of the integrated circuit may be coupled to an output of the voltage regulator module via a wire included in the interconnect region.
METHOD OF FORMING AN ELECTRONIC DEVICE STRUCTURE HAVING AN ELECTRONIC COMPONENT WITH AN ON-EDGE ORIENTATION AND RELATED STRUCTURES
An electronic device structure includes a substrate having a substrate first major surface, an opposing substrate second major surface, and a first conductive pattern adjacent to the substrate first major surface. A first electronic component is coupled to the substate and includes a first component first side and a first device structure adjacent to the first component first side. A second electronic component is adjacent to the substate second major surface and includes a second component first side and a second device structure adjacent to the second component first side. A third electronic component is coupled to the substrate. The first electronic component is generally orthogonal to the substrate and the first device structure is oriented in a first direction, and the second device structure is oriented in a second direction different than the first direction.
Devices and methods related to stack structures including passivation layers for distributing compressive force
Structures, methods and devices are disclosed, related to improved stack structures in electronic devices. In some embodiments, a stack structure includes a pad implemented on a substrate, the pad including a polymer layer having a side that forms an interface with another layer of the pad, the pad further including an upper metal layer over the interface, the upper metal layer having an upper surface. In some embodiments, the stack structure also includes a passivation layer implemented over the upper metal layer, the passivation layer including a pattern configured to provide a compressive force on the upper metal layer to thereby reduce the likelihood of delamination at the interface, the pattern defining a plurality of openings to expose the upper surface of the upper metal layer.
Terahertz device
A terahertz device of the present invention includes a terahertz element generating an electromagnetic wave, a dielectric including a dielectric material and surrounding the terahertz element, a gas space including a gas, and a reflecting film serving as a reflecting portion. The reflecting film includes a portion opposing the terahertz element through the dielectric and the gas space and reflecting the electromagnetic wave toward a direction, wherein the electromagnetic wave is generated from the terahertz element and transmitted through the dielectric and the gas space. In addition, the refractive index of the dielectric is lower than the refractive index of the terahertz element and is higher than the refractive index of the gas in the gas space.
DEVICES AND METHODS RELATED TO STACK STRUCTURES INCLUDING PASSIVATION LAYERS FOR DISTRIBUTING COMPRESSIVE FORCE
Structures, methods and devices are disclosed, related to improved stack structures in electronic devices. In some embodiments, a stack structure includes a pad implemented on a substrate, the pad including a polymer layer having a side that forms an interface with another layer of the pad, the pad further including an upper metal layer over the interface, the upper metal layer having an upper surface. In some embodiments, the stack structure also includes a passivation layer implemented over the upper metal layer, the passivation layer including a pattern configured to provide a compressive force on the upper metal layer to thereby reduce the likelihood of delamination at the interface, the pattern defining a plurality of openings to expose the upper surface of the upper metal layer.