A display panel includes: a base, a first electrode, a pixel definition layer and a first light-emitting functional layer. The first electrode is disposed on a side of the base; the pixel definition layer is disposed on the side of the base, and includes a first hollowed-out portion; the first hollowed-out portion includes a first opening and a second opening arranged oppositely, the first opening is closer to the base than the second opening, and the first opening exposes at least part of the first electrode; and the first light-emitting functional layer is disposed on sides of the pixel definition layer and the first electrode away from the base, and includes a second hollowed-out portion; an orthogonal projection of the second hollowed-out portion on the base is non-overlapping with an orthogonal projection of the first opening on the base.

The present disclosure provides a display substrate, a manufacturing method thereof, and a display device, and relates to the field of display technology. The display substrate includes a display region and a wiring region surrounding the display region. The wiring region includes: a gate line layer including a plurality of signal lines parallel to each other; an insulation layer covering the gate line layer, a groove being formed in the insulation layer at a position corresponding to a gap between adjacent signal lines; a planarization layer at a side of the insulation layer away from the gate line layer; and an active pattern layer at a side of the planarization layer away from the gate line layer.

A display substrate includes a backplane, a pixel defining layer, a gas absorption layer, and light-emitting layers. The pixel defining layer is disposed on a side of the backplane, and has a plurality of openings. The gas absorption layer is disposed on a side of the pixel defining layer away from the backplane, and is configured to absorb a gas generated by the pixel definition layer due to an action of ultraviolet rays. The gas absorption layer exposes at least part of regions of the plurality of openings. The light-emitting layers are each at least partially located in an opening in the plurality of openings.

Provided are a display panel and a manufacturing method therefor, and a display device, relating to the technical field of display. The thickness of a second part of a first electrode of a sub-pixel in the display panel can be relatively large, capable of blocking a light-emitting film layer; light emitted by part of the film layer located above a first part of the first electrode is transmitted to the area where an adjacent sub-pixel is located, light emitted by the light-emitting film layer in the sub-pixel is prevented from being emitted out of a second electrode of the adjacent sub-pixel, and then crosstalk of light of a plurality of sub-pixels is prevented.

The present disclosure is directed to providing a support substrate for a display device capable of obtaining high transparency while accomplishing thinning and flexibility of an organic EL display device.

In view of the above, the present disclosure provides a support substrate for a display device including a TFT glass substrate having a thickness of 10 μm to 150 μm, and a polyimide resin layer having a thickness of 150 nm or less installed in contact with the TFT glass substrate.

A display device includes a base layer, a circuit layer on the base layer, an auxiliary pixel defining layer disposed on the circuit layer and that includes a first opening adjacent to the circuit layer and a second opening above the first opening, an inorganic protective layer disposed on the auxiliary pixel defining layer and that includes a third opening above the second opening, a pixel defining layer disposed on the inorganic protective layer and that includes a fourth opening above the third opening, a light-emitting element disposed on the circuit layer and that includes a first electrode, a functional layer disposed on the first electrode, and a second electrode disposed on the functional layer, an auxiliary electrode layer that covers the pixel defining layer and the light-emitting element, and an inorganic layer disposed on the auxiliary electrode layer and that overlaps the pixel defining layer and the light-emitting element.

A method for manufacturing a display device includes: a step of forming a first recess, in a planarization film, overlapping a first lower electrode; a step of forming a first lower functional layer in the first recess to have a thickness lower than a depth of the first recess; a step of disposing a first screen, which has an opening corresponding to the first recess, on the planarization film, and coating the first lower functional layer with a first light-emitting layer; a step of sliding a squeegee in contact with the first screen to squeegee the first light-emitting layer and, after the squeegeeing, removing the first screen; and a step of sliding the squeegee in contact with the planarization film to squeegee the first light-emitting layer again.

According to one embodiment, a method of manufacturing a display device includes forming a first organic layer covering a lower electrode and a second organic layer on an upper portion of a partition, forming a first upper electrode and a second upper electrode, forming a first transparent layer and a second transparent layer, forming a first inorganic layer and a second inorganic layer, forming a sealing layer on the first inorganic layer and the second inorganic layer, forming a resist covering the sealing layer directly above the lower electrode and covering a part of the sealing layer directly above the partition, performing dry etching using the resist as a mask, and performing wet etching by an acidic solution using the resist as a mask.

The display panel includes a transparent substrate and a transistor and a storage capacitor formed on the transparent substrate. The transparent substrate has a light-emitting region and a light-transmitting region. The transistor and the storage capacitor are arranged in a thickness direction of the display panel. The transistor and the storage capacitor are formed on the light-emitting region without overlapping with the light-transmitting region.

A capacitor device includes two top capacitor electrodes separated from each other and symmetrical to each other, two intermediate capacitor electrodes symmetrical to each other and respectively overlapping the top capacitor electrodes, a bridge coupling the intermediate capacitor electrodes without overlapping the top capacitor electrodes, and a driving voltage line coupled to the bridge and configured to apply a common voltage to the intermediate capacitor electrodes.