A method for preparing a semiconductor structure includes the steps of providing a substrate; forming a recess over the substrate; disposing a conductive layer over the substrate; and disposing a passivation over the substrate to at least partially cover the conductive layer.

The wiring substrate includes a cavity and a plurality of vertical connecting channels disposed around the cavity. The vertical connecting channels are bonded with a resin compound and electrically connected to a routing circuitry or a conducting layer under the cavity. The bottom of the cavity is covered by a dielectric layer of the routing circuitry or the resin compound, and an aperture is formed through the dielectric layer of the routing circuitry or the resin compound to be communicated with the cavity. As a result, a semiconductor device can be face-down disposed in the cavity and electrically connected to the routing circuitry or the conducting layer by bonding wires extending through the aperture.

A semiconductor device is disclosed including at least first and second vertically stacked and interconnected semiconductor packages. Signal communication between the second semiconductor package and a host device occurs through the first semiconductor package.

A semiconductor die includes a last metallization layer above a semiconductor substrate, a bond pad above the last metallization layer, a passivation layer covering part of the bond pad and having an opening that defines a contact area of the bond pad, an insulating region separating the bond pad from the last metallization layer at least in an area corresponding to the contact area of the bond pad, and an electrically conductive interconnection structure that extends from the bond pad to the upper metallization layer outside the contact area of the bond pad. Corresponding methods of manufacture are also provided.

An apparatus includes a multilayer package substrate having a plurality of layers. The apparatus also includes a first heat sink disposed over the package substrate. The first heat sink is configured to connect to a semiconductor device and to provide an electrical ground for the semiconductor device. The apparatus includes a second heat sink disposed in the package substrate. The first heat sink overlaps substantially all of the first electrically conductive layer and no dielectric material exists in the multilayer package substrate in a region of contact of the first heat sink and the first electrically conductive layer.

An integrated circuit (IC) includes an input pad and an output pad separated from the input pad by a predetermined distance. A plurality of capacitors are coupled in series between the input pad and the output pad. The plurality of capacitors are distributed to substantially span the predetermined distance. An inductor is formed from a bond wire, having a first end attached at the first input pad and a second end attached at the output pad. The inductor and plurality of capacitors configured to form a predetermined open circuit resonance.

A semiconductor device is disclosed including at least first and second vertically stacked and interconnected groups of semiconductor packages. The first and second groups of semiconductor packages may differ from each other in the number of packages and functionality.

An isolation system, isolation device, and Integrated Circuit are disclosed. The isolation system is described to include an integrated circuit chip having a first capacitive plate, a second capacitive plate positioned with respect to the first capacitive plate to enable a capacitive coupling therebetween, an enhanced isolation layer positioned between the first capacitive the second capacitive plate that facilitates an electrical isolation between the first capacitive plate and the second capacitive plate, a first bonding wire that is in electrical communication with the second capacitive plate, and an isolation trench that at least partially circumscribes the first capacitive plate and is positioned between the first capacitive plate and the first bonding wire.

The manufacturing method of a semiconductor device can improve the mechanical strength of a pad more than before, and suppress the occurrence of a crack. The manufacturing method of a semiconductor device includes: forming a first pad constituted by a first metal layer; forming an insulating layer on the first pad; providing an opening portion in the insulating layer by removing the insulating layer on at least a partial region of the first pad; forming a second pad constituted by a second metal layer in the opening portion of the insulating layer so as to have a film thickness that is smaller than the film thickness of the insulating layer; and forming a third pad constituted by a third metal layer on the second pad.

A method of forming an electrical contact is provided. The method may include depositing, by atomic layer deposition, a passivation layer over at least a region of a metal surface, wherein the passivation layer may include aluminum oxide, and electrically contacting the region of the metal surface with a metal contact structure, wherein the metal contact structure may include copper.