H10W72/01351

METHOD OF REPAIRING A DISPLAY PANEL AND REPAIRED DISPLAY PANEL

A method of repairing a display panel and a repaired display panel are provided. The display panel includes a panel substrate, a plurality of micro LEDs arranged on the panel substrate, and a molding member covering the plurality of micro LEDs. The molding member includes a first molding member and a second molding member disposed in a region surrounded by the first molding member. The second molding member has a composition or a shape different from that of the first molding member, and the second molding member surrounds at least one side surface of the plurality of micro LEDs.

Dam for three-dimensional integrated circuit

An apparatus comprising a first substrate, a dam structure disposed on a first side of the first substrate, and an integrated circuit (IC) memory chip coupled to the first side of the first substrate by a plurality of first conductive members. A second substrate is coupled to a second side of the first substrate by a plurality of second conductive members. A lid coupled to the second substrate encloses the IC memory chip and the first substrate. A thermal interface material (TIM) is coupled between the lid and the dam structure.

PLASMA DICING WITH A PHOTO PATTERNABLE MATERIAL
20260090308 · 2026-03-26 ·

Systems and methods plasma dicing are provided. The method includes forming a mask layer on a first surface of a wafer. The mask layer includes scribe lines and the wafer is diced along the scribe lines. The method also includes forming a die attach layer of a photo patternable material on a second surface of the wafer opposite the first surface. The method further includes patterning the die attach layer to form a number of openings in the die attach layer in a predetermined pattern. The method yet further includes applying a dicing tape to the die attach layer. The method includes dicing the wafer along the scribe lines to form dies of a plurality of dies supported by the dicing tape, a die of the plurality of dies having the die attach layer of the photo patternable material.

MECHANICAL WAFER ALIGNMENT DETECTION FOR BONDING PROCESS

Various embodiments of the present disclosure are directed towards a method. The method includes providing a first semiconductor workpiece and a second semiconductor workpiece onto a platform. A plurality of positioning structures move the second semiconductor workpiece over the first semiconductor workpiece while moving from a plurality of reference positions to a plurality of first positions. A bonding apparatus is operated to bond the second semiconductor workpiece to the first semiconductor workpiece. The positioning structures are moved from the plurality of reference positions to a plurality of second positions. The positioning structures physically contact an outer perimeter of the first semiconductor workpiece and/or an outer perimeter of the second semiconductor workpiece while at the plurality of second positions. A shift value is determined between the first semiconductor workpiece and the second semiconductor workpiece based on a comparison between the plurality of first positions and the plurality of second positions.

Anisotropic conductive film and display device including same
12615931 · 2026-04-28 · ·

The disclosure relates to a display device and an anisotropic conductive film. An anisotropic conductive film disposed between a display panel and a printed circuit board, the anisotropic conductive film including a base resin, a plurality of first conductive balls dispersed in the base resin, each of the plurality of first conductive balls including a core made of a polymer material and at least one metal layer surrounding the core, and a plurality of second conductive balls dispersed in the base resin, each of the plurality of second conductive balls being made of a meltable material, and the anisotropic conductive film having a first area in which the anisotropic conductive film overlaps the first pad electrode and the first lead electrode in a thickness direction of the display device, and a second area as an area disposed between the first lead electrode and the second lead electrode. Each of the metal layer of the first conductive ball and a surface of the second conductive ball are in contact with both the first pad electrode and the first lead electrode.