H10W44/212

Vertical interconnect micro-component and method for producing a vertical interconnect micro-component
20260060092 · 2026-02-26 ·

A vertical interconnect micro-component adapted for radio frequency signal transmission, preferably for the use in three-dimensional integrated circuits, including: a glass substrate with a first side and a second side opposite to the first side, at least one inner through connector formed in the glass substrate, wherein the inner through connector includes an inner cavity in the glass substrate extending from the first side to the second side of the glass substrate, the inner cavity being fully or partially filled with solid conductor material, and an outer through connector structure formed in the glass substrate and surrounding the at least one inner through connector, the outer through connector structure including one or more outer cavities in the glass substrate extending from the first side to the second side of the glass substrate, the one or more outer cavities each being fully or partially filled with solid conductor material.

RF bridge

A radio frequency (RF) bridge that may include a body having an interfacing surface and a bonding surface extending from the interfacing surface. RF bridge may also include an interconnect operably engaged with the body. The interconnect may have at least one electrical connection positioned at the interfacing surface and at least another electrical connection positioned at the interfacing surface adjacent with the at least one electrical connection. The interconnect extends curvilinearly between the at least one electrical connection and the at least another electrical connection creating a curvilinear signal path.

Electronic package structure and manufacturing method thereof

An electronic package structure and manufacturing method thereof. The electronic package structure includes a circuit board, an interposer, a chip, a circuit structure, and a coaxial conductive element. The interposer is disposed on the circuit board. The interposer has a through groove. The chip is disposed in the through groove and located on the circuit board to electrically connect with the circuit board. The circuit structure is disposed on the interposer. The coaxial conductive element penetrates the interposer to electrically connect the circuit structure and the circuit board. The coaxial conductive element includes a first conductive structure, a second conductive structure, and a first insulating structure. The second conductive structure surrounds the first conductive structure. The first insulating structure is disposed between the first conductive structure and the second conductive structure.

Printed circuit board (PCB) including a vertical launcher having a signal via for radiating signal energy through a PCB channel region

An apparatus includes a printed circuit board (PCB), a solder pad, a signal via, a plurality of metalized vias, and a waveguide. The PCB has a first surface opposite a second surface and includes a first metal layer, a second metal layer having a waveguide opening, and a PCB channel region from the waveguide opening in the second metal layer to the second surface. The solder pad is positioned on the first surface of the PCB over the channel region, and the signal via is coupled to the solder pad and a via pad in the second metal layer within the waveguide opening. The plurality of metalized vias extend from the first surface to the second surface of the PCB and form a boundary around the channel region. The waveguide is affixed to the waveguide opening in the second metal layer.

Wiring board and semiconductor package

A semiconductor package includes a wiring board including at least one pair of connection structures electrically connecting at least one pair of differential signal transmission lines and at least one pair of differential signal transmission terminals, respectively. The at least one pair of connection structures includes first via structures staggered in a vertical direction, at least one first connection line electrically connecting the first via structures, second via structures staggered in the vertical direction, and at least one second connection line electrically connecting the second via structures. The at least one first connection line is spaced apart from the at least one second connection line in the vertical direction and electrically insulated therefrom, and intersects the at least one second connection line in the vertical direction.

SEMICONDUCTOR DEVICE WITH MULTIPLE DIES
20260082961 · 2026-03-19 ·

A semiconductor device includes a first die having ports and a second die having ports. The semiconductor device includes a multi-layer package substrate. The multi-layer package substrate includes a first layer patterned to include pads for the ports of the first die and the second die and a second layer patterned to provide vias between the pads for the ports of the first die and pads for the ports of the second die and a third layer of the multi-layer package substrate. The third layer is patterned to provide traces that couple the vias coupled to ports of the first die to vias coupled to ports of the second die to couple the first die to the second die, the traces of the third layer having a width. The multi-layer package substrate also includes a fourth layer underlying the third layer and a ground plane underlying the fourth layer.

Transistor
12615833 · 2026-04-28 · ·

A transistor according to the disclosure includes a semiconductor substrate, a source pad provided on an upper surface of the semiconductor substrate, a plurality of source electrodes provided on the upper surface of the semiconductor substrate and arranged in an arrangement direction, the plurality of source electrodes each including a first end connected to the source pad and a second end on a side opposite to the source pad, a plurality of drain electrodes arranged alternately with the plurality of source electrodes in the arrangement direction, a gate electrode and a first wire configured to connect the second ends of a plurality of central electrodes provided at a central part of the semiconductor substrate in the arrangement direction among the plurality of source electrodes, and not to connect the second ends of the source electrodes other than the plurality of central electrodes.

Semiconductor device with through package via and method therefor

A method of forming a semiconductor device is provided. The method includes encapsulating with an encapsulant at least a portion of a semiconductor die and a package substrate, the encapsulant including an additive selectively activated by way of a laser. A first opening is formed in the encapsulant, the first opening exposing a predetermined first portion of the package substrate. The additive is activated at the sidewalls of the first opening. A second opening is formed in the encapsulant, the second opening encircling the first opening and exposing a predetermined second portion of the package substrate. The additive is activated at the sidewalls the second opening. A conductive material is plated on the additive activated portions of the encapsulant.

High density three-dimensional integrated capacitors

A component includes a substrate and electrically conductive layers formed in contact with the substrate. The substrate can consist essentially of a material having a coefficient of thermal expansion of less than 10 ppm/ C. The substrate can have a surface and an opening extending downwardly therefrom. The electrically conductive layers can include at least first and second pairs of electrically conductive plates and first and second electrodes. The first and second pairs of plates can be connectable with respective first and second electric potentials. The first and second pairs of plates can extend along an inner surface of the opening, each of the plates being separated from at least one adjacent plate by a dielectric layer. The first and second electrodes can be exposed at the surface of the substrate and can be coupled to the respective first and second pairs of plates.