A regeneration solvent comprised of one or more ethylene amines may contact an adsorbent bed that has been used to remove sulfur compounds from a hydrocarbon stream to extract adsorbed sulfur compounds from the adsorbent material in the bed to regenerate it. The one or more ethyleneamines may have structure (I), (II), or (III):

##STR00001##

where R.sup.1, R.sup.2, R.sup.5 and R.sup.6 are, to the extent chemically possible, independently H, C.sub.1-C.sub.4 linear or branched alkyl, amido (RRNC═O), or hydroxyalkyl, where each R in the amido group is independently H or C.sub.1 alkyl, where R.sup.3 and R.sup.4 are alkylene of from 1 to 4 carbon atoms, where x ranges from 0 to 3, y ranges from 1 to 6. The regenerated adsorbent bed may be reused, either alone or in combination with a liquid-liquid extraction column, to remove sulfur compounds from a hydrocarbon stream.

The invention relates to a process for preparing triaryl organoborates proceeding from organoboronic esters in the presence of an n-valent cation 1/n K.sup.n+, comprising the anhydrous workup of the reaction mixture and the use of the triaryl organoborates obtained as co-initiator in photopolymer formulations, holographic media and holograms.

The invention relates to a process for preparing triaryl organoborates proceeding from organoboronic esters in the presence of an n-valent cation 1/n K.sup.n+, comprising the anhydrous workup of the reaction mixture and the use of the triaryl organoborates obtained as co-initiator in photopolymer formulations, holographic media and holograms.

The present disclosure describes solid compositions comprising a paraffin inhibitor and a corrosion inhibitor. The paraffin inhibitors include polymers having various repeat units containing one or more ester moieties. The corrosion inhibitors can be imidazoline compounds, quaternary ammonium compounds, or a combination thereof. These solid compositions can be used to treat subterranean hydrocarbon-containing reservoir and can inhibit or reduce paraffin deposition in the reservoir and/or inhibit or reduce corrosion in a piece of equipment in contact with the reservoir.

The present disclosure describes solid compositions comprising a paraffin inhibitor and a corrosion inhibitor. The paraffin inhibitors include polymers having various repeat units containing one or more ester moieties. The corrosion inhibitors can be imidazoline compounds, quaternary ammonium compounds, or a combination thereof. These solid compositions can be used to treat subterranean hydrocarbon-containing reservoir and can inhibit or reduce paraffin deposition in the reservoir and/or inhibit or reduce corrosion in a piece of equipment in contact with the reservoir.

A novel method for synthesizing deuterated amides and deuterated sulfonamides includes the following steps: (1) adding a compound M, DMAP, R.sup.3—X to a solvent to obtain a compound N after a reaction is complete; and (2) adding the compound N, R.sup.4—NH—R.sup.5, or a salt and base thereof to a solvent, and purifying after a reaction is complete to obtain a compound I. ##STR00001##

A novel method for synthesizing deuterated amides and deuterated sulfonamides includes the following steps: (1) adding a compound M, DMAP, R.sup.3—X to a solvent to obtain a compound N after a reaction is complete; and (2) adding the compound N, R.sup.4—NH—R.sup.5, or a salt and base thereof to a solvent, and purifying after a reaction is complete to obtain a compound I. ##STR00001##

Methods and intermediates for synthesizing triethylenetetramine and salts thereof, as well as novel triethylenetetramine salts and their crystal structure, and triethylenetetramine salts of high purity.

Methods and intermediates for synthesizing triethylenetetramine and salts thereof, as well as novel triethylenetetramine salts and their crystal structure, and triethylenetetramine salts of high purity.

Provided herein are molecules and salts thereof, arrays containing molecules and salts thereof, solid supports containing molecules and salts thereof, kits containing molecules or salts thereof, and methods of determining alignment of photolithographic masks comprising molecules or salts thereof.