Methods for controlled microstructure creation utilize seeding of amorphous layers prior to annealing. Seed crystals are formed on an amorphous layer or layers. The material, size, and spacing of the seed crystals may be varied, and multiple seed layers and/or amorphous layers may be utilized. Thereafter, the resulting assembly is annealed to generate a crystalline microstructure. Via use of these methods, devices having desirable microstructural properties are enabled.

Methods for controlled microstructure creation utilize seeding of amorphous layers prior to annealing. Seed crystals are formed on an amorphous layer or layers. The material, size, and spacing of the seed crystals may be varied, and multiple seed layers and/or amorphous layers may be utilized. Thereafter, the resulting assembly is annealed to generate a crystalline microstructure. Via use of these methods, devices having desirable microstructural properties are enabled.

Unique and improved chromizing processes are disclosed. The processes involve forming localized chromizing coatings onto selected regions of a substrate. The chromium diffusion coatings are locally applied to selected regions of substrates in a controlled manner, in comparison to conventional chromizing processes, and further in a manner that produces less material waste and does not require masking. A second coating can be selectively applied onto other regions of the substrate.

Unique and improved chromizing processes are disclosed. The processes involve forming localized chromizing coatings onto selected regions of a substrate. The chromium diffusion coatings are locally applied to selected regions of substrates in a controlled manner, in comparison to conventional chromizing processes, and further in a manner that produces less material waste and does not require masking. A second coating can be selectively applied onto other regions of the substrate.

A novel dual layer mask formulation is provided. In particular, the mask has a unique composition that protects the integrity of an underlying chromide coating, prevents chromium depletion from the chromide coating and prevents a subsequent aluminide coating from being deposited thereon.

An apparatus for masking an article with masking material is disclosed. The apparatus generally includes a spray head connected to a primary channel which forms a passage for the masking material. This channel has two sections, the first of which terminates in a junction with the spray head and is angled from the second section. In addition, the apparatus has at least one secondary channel which forms an air passage and is attached to the primary angled channel.

An apparatus for masking an article with masking material is disclosed. The apparatus generally includes a spray head connected to a primary channel which forms a passage for the masking material. This channel has two sections, the first of which terminates in a junction with the spray head and is angled from the second section. In addition, the apparatus has at least one secondary channel which forms an air passage and is attached to the primary angled channel.

A compressor blade for a gas turbine is provided. The compressor blade has a blade substrate that consists of a metal alloy and has an aluminum diffusion zone on a surface of the blade substrate. In addition, the compressor blade has a hard material coating provided on the surface of the blade substrate. A compressor that has a compressor blade and a method of producing such a compressor blade is also provided.

A compressor blade for a gas turbine is provided. The compressor blade has a blade substrate that consists of a metal alloy and has an aluminum diffusion zone on a surface of the blade substrate. In addition, the compressor blade has a hard material coating provided on the surface of the blade substrate. A compressor that has a compressor blade and a method of producing such a compressor blade is also provided.

An interspacer is configured to be disposed in an area of a device. The area has a height. The interspacer includes a lower portion having a first end and a second end. The interspacer includes an upper portion extending above the lower portion and having a projecting member. The projecting member extends beyond the second end away from the first end. A height of the interspacer is equal to the height of the area.