Disclosed herein are methods, systems, and devices for monitoring cumulative radiation. In one embodiment, a device includes a photodiode; an integrating capacitor electrically coupled with the photodiode; a voltage discharge switch electrically coupled with the integrating capacitor; and amplifier circuitry electrically coupled with the photodiode and the integrating capacitor. The amplifier circuitry is configured to maintain a substantially zero bias voltage between an anode and a cathode of the photodiode monitoring the cumulative radiation. The integrating capacitor is configured to provide a delta voltage representative of radiation received since the beginning of a charge cycle of the integrating capacitor.

Material structures, systems and devices are disclosed. The material structures are active materials, which are able to emit UV/visible light under excitation by bias, by light beam or by electron beam. The input unit is a source of voltage/current or a source of light or a source of electron beam. The active unit is a material structure containing one or more layers of the described materials. The system may include a passive unit such as a ring resonator, a waveguide, coupler, grating or else. Additional units such as a control unit, readout unit or else may be also incorporated.

The distinguished characteristic of the present invention is that the UV or visible emission from the described structures cannot happen without the presence of at least one of the following quasi-particles: surface plasmons, surface plasmon polaritons, bulk plasmons and/or bulk plasmon polaritons. These quasi-particles assist the UV and the visible light emission.

In an approach to monitoring sunscreen effectiveness, a computer receives input from a user. The computer receives data corresponding to ultraviolet radiation exposure from a first ultraviolet radiation sensor and a second ultraviolet radiation sensor. The computer determines an amount of ultraviolet radiation received by the first ultraviolet radiation sensor and the second ultraviolet radiation sensor. The computer determines whether the amount of ultraviolet radiation received by the first ultraviolet radiation sensor is similar to the amount of ultraviolet radiation received by the second ultraviolet radiation sensor. The computer determines whether the amount of ultraviolet radiation received by the first ultraviolet radiation sensor is below an alert threshold. In response to determining the amount of ultraviolet radiation received by the first ultraviolet radiation sensor is not below an alert threshold, the computer transmits an alert message to the user.

Systems, devices and methods for calibrating or increasing the accuracy of light sensing devices. The methods can include calibrating a light sensing device with a calibration source that is adapted to mimic at least one representative spectrum.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

An instrumented substrate apparatus is configured to measure wavelength-resolved radiation, such as extreme ultraviolet radiation. The instrumented substrate apparatus includes a substrate and photoelectric sensors on the substrate. The photoelectric sensors include a photoemissive material, a photoelectron collector, and a measurement circuit. The measurement circuit is electrically coupled to the photoemissive material and the photoelectron collector. The measurement circuit is configured to measure a current generated by the photoelectron collectors by a current meter. Such current is used to determine the wavelength-resolved EUV measurement information by a controller on the instrumented substrate apparatus, or by communicating the current to a factory automation system.

A semiconductor device for flame detection, including: a semiconductor body having a first conductivity type conductivity, delimited by a front surface and forming a cathode region; an anode region having a second conductivity type conductivity, which extends within the semiconductor body, starting from the front surface, and forms, together with the cathode region, the junction of a photodiode that detect ultraviolet radiation emitted by the flames; a supporting dielectric region; and a sensitive region, which is arranged on the supporting dielectric region and varies its own resistance as a function of the infrared radiation emitted by the flames.

Methods of accurately estimating erythemaly-weighted UV exposure, such as the UV Index, and sensors adapted for the same.

An excimer bulb assembly including an excimer bulb and a pass filter such that the excimer bulb assembly does not emit substantial UV radiation in wavelengths longer than 231 nm, 232 nm, 233 nm, 234 nm or 235 nm. The wavelengths are measured at an incident angle of zero (0) degrees to the filter plane. The pass filter is preferably constructed of a plurality of layers of hafnium oxide, and most preferably constructed of less than seventy five (75) layers of hafnium oxide. The excimer bulb, pass filter, and two electrical connectors may be adapted to form a cartridge which may be adapted to swivel along its main axis. The cartridge may further include a smart chip. The smart chip may retain and store information regarding the assembly and preferably retains hours of use of the excimer bulb.

A process for improving sensitivity of a film base, coated with a dispersion of a normally crystalline polyacetylenic compound in a non-solvating liquid which is dried on the film surface, to particular photon energy band, specifically, long wavelength UV; the polyacetylenic compound preferably having at least two conjugated acetylenic linkages and containing from 12 to 60 carbon atoms. The sensitization of the film to long wavelength UV is achieved via the addition of photoinitiator(s) capable of absorbing UV energy and converting it to free radicals.