Provided are a manufacturing method of a display substrate, a display substrate and a display device, which belongs to the field of display technologies. The manufacturing method of the display substrate includes: forming a first planarization layer on a base substrate on which a patterned film layer is formed; forming a first buffer layer on the side, away from the base substrate, of the first planarization layer; forming a second buffer layer on the side, away from the base substrate, of the first buffer layer; and forming a Wire Grid Polarizer (WGP) on the side, away from the base substrate, of the second buffer layer.

A liquid crystal display panel and a preparation method thereof, the liquid crystal display panel includes: a first substrate including an active display area and an inactive display area; a second substrate disposed opposite to the first substrate; a thin film transistor layer including a gate electrode layer, a gate insulating layer, an active layer, and a source and drain layer; a first passivation layer; a color photoresist layer; a planarization layer; a pixel electrode layer; a liquid crystal layer; and a second passivation layer disposed between the planarization layer and the liquid crystal layer of the active display area.

Provided are a manufacturing method of a display substrate, a display substrate and a display device, which belongs to the field of display technologies. The manufacturing method of the display substrate includes: forming a first planarization layer on a base substrate on which a patterned film layer is formed; forming a first buffer layer on the side, away from the base substrate, of the first planarization layer; forming a second buffer layer on the side, away from the base substrate, of the first buffer layer; and forming a Wire Grid Polarizer (WGP) on the side, away from the base substrate, of the second buffer layer.