A plurality of unit MISFET elements connected in parallel with each other to make up a power MISFET are formed in an LDMOSFET forming region on a main surface of a semiconductor substrate. A control circuit that controls a gate voltage of the power MISFET is formed in a driver circuit region on the main surface of the semiconductor substrate. A wiring structure having a plurality of wiring layers made of the same metal material is formed on the semiconductor substrate. The gate electrodes of the plurality of unit MISFET elements formed in the LDMOSFET forming region are electrically connected to each other via gate wirings formed in all of the plurality of wiring layers made of the same metal material.

A structure includes channel regions located between source/drain regions, and a polysilicon gate structure including a plurality of gate fingers, each extending over a corresponding channel region. Each gate finger includes first and second rectangular portions extending in parallel with a first axis, and a connector portion that introduces an offset between the first and second rectangular portions along a second axis. This offset causes each source/drain region to have a first section with a first length along the second axis, and a second section with a second length along the second axis, greater than the first length. A single column of contacts having a first width along the second axis is provided in the first section of each source/drain region, and a single column of contacts having a second width along the second axis, greater than the first width, is provided in the second section of each source/drain region.

In an embodiment, a Group III nitride transistor device includes a Group III nitride-based semiconductor body having a Group III nitride barrier layer arranged on a Group III nitride channel layer and forming a heterojunction therebetween capable of supporting a two-dimensional charge gas. A switching Group III nitride transistor device and a current sense Group III nitride transistor device are formed in the Group III nitride-based semiconductor body. The current sense Group III nitride transistor device is electrically insulated from the switching Group III nitride transistor device by local interruption of the two-dimensional charge gas.

An electronic device, comprising plurality of source metal strips in a first metal level; a plurality of drain metal strips in the first metal level; a source metal bus in a second metal level above the first metal level; a drain metal bus, in the second metal level; a source pad, coupled to the source metal bus; and a drain pad, coupled to the drain metal bus. The source metal bus includes subregions shaped in such a way that, in top-plan view, each of them has a width which decreases moving away from the first conductive pad; the drain metal bus includes subregions shaped in such a way that, in top-plan view, each of them has a width which decreases moving away from the second conductive pad. The first and second subregions are interdigitated.

A nitride semiconductor device 1 includes a conductive SiC substrate 2 that has a first surface 2a and a second surface 2b opposite thereto, a semi-insulating SiC layer 3 that is formed in at least a portion of a surface layer portion at the first surface 2a side of the conductive SiC substrate 2, and a nitride epitaxial layer 40 that is formed on the conductive SiC substrate 2 such as to cover the semi-insulating SiC layer 3.

Embodiments of this application disclose a package structure and a communications device to which the package structure is applied. The package structure includes a substrate, a die, and a bonding layer configured to bond the die to the substrate. Charged particles are disposed in the bonding layer. An electrode is disposed on a surface of the die away from the bonding layer. A potential of the electrode is opposite to that of the charged particle. The package structure further includes a first shielding structure. A potential of the substrate is zero. The first shielding structure is located on an outer surface of the die and is located between the bonding layer and the electrode, to prevent the charged particles from migrating to the electrode.

A semiconductor chip stack module that includes a substrate, two first semiconductor chips supported by the substrate, and a second semiconductor chip stacked on both of the two first semiconductor chips. The second semiconductor chip is electrically connected to both of the two first semiconductor chips by a conductive paste configured between the second semiconductor chip and both of the two first semiconductor chips. As multiple standard chips are stacked in the power module, and their number as well as the connection methods (e.g. series or parallel) are flexible so that the user can choose which electric characteristic(s) to be increased in the power module with the stacked chips.

Implementations of a semiconductor package may include two or more die, each of the two more die coupled to a metal layer at a drain of each of the two more die, the two or more die and each metal layer arranged in two parallel planes; a first interconnect layer coupled at a source of each of the two more die; a second interconnect layer coupled to a gate of each of the two or more die and to a gate package contact through one or more vias; and an encapsulant that encapsulates the two or more die and at least a portion of the first interconnect layer, each metal layer, and the second interconnect layer.

A semiconductor device may include a plurality of transistors, with a first array of low-resistance material formed in a first dielectric layer, with a gate subset of the first array formed on a plurality of gate electrodes of the transistors, and a source subset of the first array formed on a plurality of source regions of the transistors. A second array of low-resistance material may be formed in a second dielectric layer, with a gate subset of the second array formed on the gate subset of the first array and thereby electrically connected to the plurality of gate electrodes, and a source subset of the second array formed on the source subset of the first array and thereby electrically connected to the plurality of source regions.

A high frequency semiconductor amplifier according to the present disclosure includes: a transistor formed on a semiconductor substrate and including a gate electrode, a source electrode, and a drain electrode; a matching circuit for input-side fundamental wave matching of the transistor; a first inductor formed on the semiconductor substrate and having one end connected to the gate electrode of the transistor and the other end connected to the matching circuit; a capacitor formed on the semiconductor substrate and having one end being short-circuited; and a second inductor formed on the semiconductor substrate and having one end connected to the gate electrode of the transistor and the other end connected to the other end of the capacitor, wherein the second inductor resonates in series with the capacitor at second harmonic frequency, has a mutual inductance of subtractive polarity with the first inductor, and the first inductor and the second inductor form mutual inductive circuits for input-side second harmonic matching.