The number of masks and photolithography processes used in a manufacturing process of a semiconductor device are reduced. A first conductive film is formed over a substrate; a first insulating film is formed over the first conductive film; a semiconductor film is formed over the first insulating film; a semiconductor film including a channel region is formed by etching part of the semiconductor film; a second insulating film is formed over the semiconductor film; a mask is formed over the second insulating film; a first portion of the second insulating film that overlaps the semiconductor film and second portions of the first insulating film and the second insulating film that do not overlap the semiconductor film are removed with the use of the mask; the mask is removed; and a second conductive film electrically connected to the semiconductor film is formed over at least part of the second insulating film.

The present disclosure provides a display device with a display panel, an input sensing unit, and a protective member. The input sensing unit is disposed on the display panel. The protective member includes an insulating material and is disposed on the input sensing unit. The protective member includes a first protective portion and a second protective portion disposed on the first protective portion, where a first modulus of the first protective portion is greater than a second modulus of the second protective portion. The second protective portion with the lower modulus absorbs external impacts, and the first protective portion with the higher modulus disperses the absorbed impact and prevents the display panel from being deformed by an external force. Therefore, the impact resistance of the display device is improved.

Disclosed are methods of preparing lens arrays, display apparatuses, and methods of preparing display apparatuses. A method of preparing a lens array includes: forming a hybrid film on a base substrate, the hybrid film including first hybrid sub-films arranged in an array and a second hybrid sub-film, and a contact angle of a liquid on a surface of the first hybrid sub-film being less than a contact angle of the liquid on a surface of the second hybrid sub-film; coating the hybrid film with a photo-curable resin to form liquid droplets arranged in an array, the liquid droplets being lens-shaped and located on the first hybrid sub-films, respectively; and photo-curing the photo-curable resin to obtain lenses arranged in an array, the lenses being located on the first hybrid sub-films, respectively.

Provided are a display apparatus and a method of manufacturing the same. The display apparatus includes a substrate, a first conductive layer disposed on the substrate, and a first insulating pattern disposed on the first conductive layer. The first insulating pattern includes a fluorine compound and a nitrogen compound. The nitrogen compound is represented by Formula 1:

NR.sub.1R.sub.2R.sub.3OH  <Formula 1> wherein in Formula 1, R.sub.1 to R.sub.3 are each independently selected from hydrogen, a substituted or unsubstituted C.sub.1-C.sub.20 alkyl group, a substituted or unsubstituted C.sub.6-C.sub.30 aryl group, and a substituted or unsubstituted C.sub.7-C.sub.30 aralkyl group.

A display substrate and a manufacturing method therefor, and a display device. The display substrate comprises a stretchable area, the stretchable area comprises multiple pixel island areas spaced apart from each other, multiple hole areas, and connection bridge areas located between the pixel island areas and the hole areas; each of the hole areas is provided with one or more openings, and comprises a composite structural layer stacked on the substrate, each of the openings penetrates through the composite structural layer and a part of the opening is provided in the substrate, the opening penetrates through or does not penetrate through the substrate, and the wall of the opening is provided with separation grooves; and each of the hole areas further comprises a functional film layer provided on the composite structural layer and on the wall of each opening, and the functional film layer is separated at the separation grooves.

A display device according to one embodiment is a display device in which a first folding area, a first non-folding area on one side of the first folding area, and a second non-folding area on the other side of the first folding area are defined, and comprises a first substrate, a second substrate disposed on the first substrate, a liquid crystal layer disposed between the first substrate and the second substrate, and an upper polarization member disposed on one surface of the second substrate and spaced apart from the liquid crystal layer with the second substrate interposed therebetween, wherein the second substrate has a first thickness, which is partially slimmed, in the first folding area, the second substrate has a second thickness, which is greater than the first thickness and corresponds to an original thickness of a flat display element without being slimmed, in each of the non-folding areas, the upper polarization member is disposed over the first non-folding area, the folding area and the second non-folding area, a first gap distance between one surface of the second substrate and the upper polarization member in the first folding area is greater than a second gap distance between one surface of the second substrate and the upper polarization member in each of the non-folding areas.

An example dual plate Organic Light-Emitting Field-Effect Transistor (OLET) display device includes a first plate device having a first substrate; a gate layer adjacent to the first substrate; and a dielectric layer adjacent to the gate layer. A second plate device is connected to the first plate device. The second plate device includes a second substrate; a source/drain layer adjacent to the second substrate; and a stacked active organic layer adjacent to the source/drain layer. The first plate device and the second plate device are to be independently fabricated and joined together to position the stacked active organic layer adjacent to the dielectric layer.

A light-emitting substrate, comprising a base, a pixel defining layer arranged on the base, and a plurality of light-emitting devices. The pixel defining layer is provided with a plurality of openings, and each light-emitting device comprises a quantum dot light-emitting pattern arranged in an opening, wherein each opening has a side wall, the side wall comprises a first portion and a second portion, the first portion is the portion of the side wall that is in contact with the quantum dot light-emitting pattern, and the second portion is the portion of the side wall that is away from the base relative to the first portion. The light-emitting substrate further comprises at least one blocking unit, each blocking unit comprises at least one siloxane chain segment, and each siloxane chain segment comprises at least one silicon oxygen bond; and each blocking unit is located in an opening, and at least one siloxane chain segment in each blocking unit is grafted to the second portion of a corresponding side wall.

A display substrate includes a substrate and a color filter layer disposed on the substrate. The color filter layer includes a plurality of filter units arranged in an array and a plurality of light-shielding units. Every two adjacent filter units are provided with a light-shielding unit of the plurality of light-shielding units therebetween. The light-shielding unit includes a filter pattern of a first color and a filter pattern of a second color that are stacked in a thickness direction of the substrate, the filter pattern of the first color is closer to the substrate than the filter pattern of the second color.

The present disclosure provides a display panel and a method of manufacturing the same and a display device. In a sub-pixel driving circuit of the display panel, a gate electrode of a driving transistor is coupled to a second electrode of a second transistor through a fourth conductive connection portion, and a second electrode plate of a storage capacitor is coupled to a second electrode of a first transistor through a third conductive connection portion, a gate electrode of the first transistor and a gate electrode of the second transistor are respectively coupled to a gate line pattern in the corresponding sub-pixel area; orthographic projection of the gate line pattern on the substrate does not overlap orthographic projection of the third conductive connecting portion on the substrate, and/or does not overlap orthographic projection of the fourth conductive connection portion on the substrate.