Provided is a coating liquid for forming a piezoelectric thin film containing lead zirconate titanate, the coating liquid including a complex precursor containing at least three kinds of metal elements of Pb, Ti, and Zr, the coating liquid being free from an exothermic peak at a temperature of 450 C. or more, or having a heat generation amount at a temperature of from 400 C. to 450 C., which is larger than a heat generation amount at a temperature of from 450 C. to 500 C., in differential thermal analysis of the coating liquid.

A method for forming a light extraction layer including nanostructures, the method including: providing a substrate, the substrate being at least partially transparent to UV light; forming a non-aqueous precursor solution comprising fluorine and an alkaline earth metal to form alkaline earth metal difluoride particles; applying the precursor solution on at least a first side of the substrate; drying the substrate at a first temperature for a first period of time; and baking the substrate at a second temperature, higher than the first temperature, for a second period of time, thereby forming a light extraction nanostructure layer comprising alkaline earth metal difluoride nanostructures on the substrate. Also, a light extraction structure and to a UV lamp including such an extraction structure.

A steel sheet coating apparatus includes a cleaner configured to apply cleaning liquid to thereby clean a surface of a steel sheet, a polisher that applies polishing liquid to the cleaned surface of the steel sheet and that includes at least one polishing wheel configured to polish the surface of the steel sheet, a coater that includes a plurality of coating rollers that are configured to coat the polished surface of the steel sheet with coating liquid, and a curing furnace that includes curing chambers that are configured to heat the steel sheet coated with the coating liquid, that have different heating temperatures, and that are configured to cure the coating liquid on the steel sheet based on heating the steel sheet in one chamber having a first temperature and then heating the steel sheet in another chamber having a second temperature greater than the first temperature.

Embodiments of the present invention describe a method for manufacture of a gel material comprising the steps of: forming a gel sheet by dispensing a gel precursor mixture; allowing gelation to occur to the gel precursor mixture; and cooling the formed gel with a cooling system to control reaction rate.

A method is provided of forming a coating within an internal pathway. The method comprises: providing a body having an inlet and an outlet and an internal surface which defines an internal pathway extending within the body between the inlet and the outlet; streaming a mixture of a gas and a fluid along at least a part of a length of the internal pathway, the fluid comprising one or more substances for forming a solid coating on the internal surface, the fluid being a liquid solution of said one or more substances in a solvent or being a dispersion with at least one of said one or more substances being solid particles dispersed in a liquid continuous phase; during said streaming of the mixture, applying localised heat progressively along said at least a part of the length of the internal pathway. The progressive application of localised heat causes, within said at least a part of the length of the internal pathway, formation from the one or more substances of a solid coating on the internal surface.

A method for depositing a metal oxide film in a liquid environment is provided, and includes steps of: dissolving an oxidizing agent in solvent with hydrogen bond to form a solution, and placing a substrate into the solution for performing a deposition reaction to deposit a metal oxide hydroxide film on the substrate. The oxidizing agent is potassium permanganate, potassium chromate, or potassium dichromate, a reaction temperature of the deposition reaction ranges from 1 to 99 degrees Celsius, and a reaction pressure environment of the deposition reaction is an atmospheric pressure environment.

A solution deposition method includes: applying a liquid precursor solution to a substrate, the precursor solution including an oxide of a first metal, a hydroxide of the first metal, or a combination thereof, dissolved in an aqueous ammonia solution; evaporating the precursor solution to directly form a solid seed layer on the substrate, the seed layer including an oxide of the first metal, a hydroxide of the first metal, or a combination thereof, the seed layer being substantially free of organic compounds; and growing a bulk layer on the substrate, using the seed layer as a growth site or a nucleation site.

In some embodiments, a semiconductor fabrication tool is provided. The semiconductor fabrication tool includes a first heating plate arranged within a processing chamber and a second heating plate arranged within the processing chamber vertically over the first heating plate. A first exhaust port is arranged within the processing chamber and a second exhaust port arranged within the processing chamber vertically over the first exhaust port. The first exhaust port is in communication with the first heating plate and is coupled to a first exhaust output. The second exhaust port is in communication with the second heating plate and is coupled to a second exhaust output. A first control element is configured to control a first exhaust pressure at the first exhaust port and a second control element is configured to control a second exhaust pressure at the second exhaust port.

The present invention relates to a method for producing silicon carbide-containing fibers or silicon carbide-containing nano- and/or micro-structured foams, and to the use thereof, in particular as anode materials for lithium-ion storage batteries.

In some embodiments, a semiconductor fabrication tool is provided. The semiconductor fabrication tool includes a first processing zone having a first ambient environment and a second processing zone having a second ambient environment disposed at different location inside a processing chamber. A first exhaust port and a second exhaust port are disposed in the first and second processing zones, respectively. A first exhaust pipe couples the first exhaust port to a first individual exhaust output. A second exhaust pipe couples the second exhaust port to a second individual exhaust output, where the second exhaust pipe is separate from the first exhaust pipe. A first adjustable fluid control element controls the first ambient environment. A second adjustable fluid control element controls the second ambient environment, where the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable.